Abstract Submissions

The Virtual Vacuum Congress 2021 Organising Committee invites the submission of abstracts of original work for consideration as an oral or poster presentation in the Congress Program.

Not exactly in the vacuum field? That’s OK! We cover 9 divisions of science.

It is critical we come together to share our latest research and findings – vacuum science and technology is a powerful enabler of Science working invisibly behind the scenes in many fields of Science and Technology to produce meaningful transformation across the globe. We wish therefore to highlight the Science as well as the Enabler, Academia as well as Industry; our nine Scientific Divisions reflect well this point of view. We are accepting submissions covering nine divisions. Which field are you currently exploring and experimenting with in your research?

  • Applied Surface Science
  • Biointerfaces
  • Electronic Materials & Processing
  • Nanometer Structures
  • Plasma Science & Technique
  • Surface Engineering
  • Surface Science
  • Thin Film
  • Vacuum Science and Technology

It is important you read all instructions below before submitting your abstract.  Should you have any questions or require assistance, contact vacuumcongress@arinex.com.au 

Be part of the program

Abstract Template

Division Descriptions

This division focuses on the application of the concepts and tools of surface science to problems in solid state physics and chemistry and materials science and technology. Current emphasis is on characterisation of surfaces and interfaces and the quantification of surface analysis techniques. The Division is the gathering place for the global community of surface analysts with historic emphasis on techniques such as SIMS, XPS, and Auger spectroscopies. Contributions are a blend of fundamental research in measurement science along with cutting-edge applied studies in nanoscience, materials for energy conversion, semiconductor processing, polymers, biotechnology and more. We encourage the development in applied surface analysis and analytical data processing.

For VVC-21 we are also focusing on the following cross-cutting Divisional areas:

  • Advanced instrumentation and techniques
  • DFT for electron and neutron spectroscopy
  • Automated and remote measurements
  • Catalysis and electro/photochemistry
  • Energy – Hydrogen
  • Multiferroics, thermoelectrics
  • Photovoltaics
  • Surface chemistry and vacuum science for food

This division focuses on the interaction of biological fluids with solid surfaces. The applications are linked with biomaterials, biotechnology, personal care and medical devices, food production, but also adhesion, corrosion and fouling.

  • Cross-cutting areas of focus include:
  • Nanostructured materials in medicine
  • Nanofluidics, nanofiltration
  • Nano-bio and nano-bio-geo sciences
  • High resolution microscopy
  • 3D Structures and 3D Analysis of Biomaterials
  • Biomolecules at surfaces
  • Advanced instrumentation and techniques
  • Simulation and Modeling of Biomaterials and Biosystems

This division focuses on the science and technology pertaining to preparation, growth, processing and characterisation of materials used in device fabrication. Typical interests include silicon and compound semiconductors, the structure of interfaces and their growth and processing, CVD and MBE deposition, e-beam and photo-lithography, plasma- and ion-etching techniques, surface chemical behavior, quantum well structures, photonic and opto-electronic technologies, VLSI/submicron devices, interconnects and packaging.

Cross-cutting areas of focus include:

  • Atomic Scale Processing for Devices
  • Electronic and Photonic Materials and Devices
  • Bottom-up Nanostructures
  • Electronic and Photonic Devices for Energy Conversion and Storage
  • Multiferroics, thermoelectrics
  • Perovskite-based solar cells

This division focuses on experimental and theoretical research on nanometer sized structures, as well as technological consequences of those structures. Interests include innovative techniques to fabricate low dimensional, one- and zero-dimensional structures, analytical tool development providing nanometer-scale resolution with composition/structure/property characterisation, exploration of new science and the models for understanding nanometer structures, and exploitation of nanometer-structure properties for new technologies.

Focus areas of interest are:

  • Low dimensional magnetism
  • Magnetic structures for computing
  • Energy Efficient Nanoelectronics
  • Nanofabrication
  • Nanophotonics and Sensing

Plasma Science and Technique Division (formerly known as the Fusion Division) is concerned with state-of-the-art advances in plasma science, ranging from fundamental studies of plasma physics and chemistry, plasma-matter interactions to new applications for plasma processing. The latest advancements in plasma research for established fields such as semiconductor fabrication to newer areas of study such as energy research, novel materials synthesis, catalysis, and biomedical applications, where plasma is either the focus or the enabling tool.

Areas of interest are:

  • Advanced BEOL
  • Interconnect Materials and Etching
  • Advanced FEOL
  • Plasma processing for logic devices
  • EUV and Multi Patterning
  • Advanced Packaging, Thermal Management, and Heterogeneous Integration
  • Plasma Processing for Advanced and Emerging Memory Technologies
  • Plasma-assisted Atomic Layer Etching
  • Plasma Surface Interactions
  • Plasma Deposition and ALD processes for coatings and thin films
  • Plasma Diagnostics, Sensors and Control
  • Plasma Sources; Modelling of plasmas, Plasma-Driven Processes, and Machine Learning
  • Atmospheric Pressure Plasmas and their applications
  • Plasma Chemistry and Catalysis
  • Plasmas for the environment (e.g. water, air, soil treatment)
  • Plasma-engineered materials and interfaces for the environment
  • Plasma and plasma-engineered materials for energy savings
  • Plasma for medicine and biointerfaces
  • Plasma for antimicrobial treatments

Surface engineering deals with the materials science and technology of modifying and improving the surface properties of materials for protection in demanding contact conditions or aggressive environments, as well as designing different functionalities with respect to the of combination of electrical, optical, thermal, chemical, and biochemical responses, including adaptive and active control of functions. Strategies include both substrate surface modification via plasma, ion-, electron-, laser-beam processes, as well as deposition processes such as physical vapor deposition, chemical vapor deposition , spray, sol-gel, etc. Surface engineering involves multiple/hybrid techniques to form gradient near-surface architectures with special attention to interface design. Areas of scientific interest span the full spectrum of fundamental scientific understanding via modeling, synthesis-structure-property-performance relationships, to real-world engineering applications.

Areas of interest include:

  • Vapor Deposition and HiPIMS in Surface Engineering
  • Nanostructured and Multifunctional Thin Films and Coatings
  • Mechanical and Tribological properties/Characterisation of Thin Films and Coatings
  • New Trends and Industrial Applications in Surface Engineering

Experimental and theoretical research on solid surfaces and interfaces, as well as gas-solid and liquid-solid interactions, broadly define the scope of this division. Current emphasis is on electronic, ion, atom, and photon interactions with surfaces and on the structure, electronic and magnetic properties, and dynamics of surface processes. The latter include surface reactions, diffusion, and catalysis.

Topics of interest include:

  • Operando methods
  • Catalytic surfaces
  • Environmental and atmospheric surfaces under realistic pressure conditions
  • Photochemistry and electrochemistry for energy applications
  • Molecular organization at surfaces
  • Chemistry of thin film growth and etching
  • Astrochemistry and surfaces for space and extreme environments

This division is devoted to production and use of films from research to device and mechanical applications. Its interests include preparation techniques, including new technologies, such as photon-, electron-, and ion-enhanced deposition and processing, electrical and mechanical properties, process monitoring, and analytical characterisation methods. Interests extend to diffusion and electromigration, growth, structure, epitaxy, nucleation, and chemical phenomena at thin film interfaces.

Interest areas are:

  • Thin film magnetism and devices
  • Surface reactions and growth mechanisms to novel processes, precursors, scale up, and emerging applications
  • Solution based methods
  • Simulation and machine learning to thin film growth
  • Microelectronics and advanced memory applications
  • Interfaces and contacts, flexible electronics, plasmonic, photonic, and metamaterials, energy, and catalysis.
  • Wide bandgap and ultrawide bandgap materials
  • Organic and hybrid materials
  • Polymer modification using vapor infiltration methods
  • Vapor deposition of functional polymer films
  • Thin films for quantum computing
  • Interfacial phenomena in thin film growth

All phenomena impacting the production, measurement, and analysis of vacuum. The division is interested in the permeability of materials, vacuum pumping, outgassing and contamination, as well as new leak detection techniques and improved total and partial pressure measurements. Standards for these and other measurements are continually reviewed by the Division.

Areas of interest:

  • Vacuum Measurement
  • Vacuum Pumping
  • Large Vacuum Systems
  • Accelerator
  • Vacuum Technology for Quantum Applications
  • Next Generation Synchrotron Light Sources
  • Extreme light infrastructure
  • Fusion Research
  • Laser driven neutron sources
  • Virtual education and events
  • Vacuum measurement and control

Submission Information

  1. Read the General Policies and Requirements for the submission of abstracts.
  2. Write your abstract following the Abstract Format & Layout Guidelines.
  3. Download the Abstract Template and insert/add your abstract text. Save as a .doc  or .docx document to your computer. Please note: Abstracts must not exceed a 300 word limit including references. The word limit relates only to the text of the abstract and does not include title, authors and institutions.
  4. Click on the button to the right to complete the Abstract Submission Form. It will be necessary to attach/upload the .doc/.docx copy of your abstract.
Format and Layout Guidelines
  • All abstracts must be submitted in English.
  • Abstracts must not exceed a 300 word limit including references. The word limit relates only to the text of the abstract and does not include title, authors and institutions.
  • Font type must be Tahoma Font 10pt.
  • Use single line spacing.
  • Tables or graphics may be included.
  • Scientific and symbol characters (ie ± , µ, ß) may be used.
  • The abstract submission platform will allow a title of up to 180 characters in length.
  • Abstracts must be free of typographical and grammatical errors.
  • Standard abbreviations may be used for common terms only. Otherwise, any abbreviation should be given in brackets after the first full use of the word. Abbreviations may be used in the title, provided the name in full is outlined in the body of the abstract.
  • You will be asked to provide a short biography (up to 150 words) with your submission.
  • You will be asked to nominate your preference for poster or oral presentation.
  • There is no need to include the abstract title or authors in the Word document that will be uploaded.  The word document should be the body of your submission only.
  • It is the author’s responsibility to ensure the title, author and affiliation details entered in the paper submission site are correct and exactly as they should be published on the abstract and all Meeting materials
General Policy and Requirements
  • The presenting author must register and pay to attend the Congress to present in the program. 
  • Research work should be original and innovative. Work can be presented prior to the Congress but MUST include new information.
  • You will be asked to nominate your preferred presentation format:
    • oral presentation (15 mins)
    • digital poster

Not all requests can be accommodated based on the available program, and the final mode of your presentation will be selected by the Organising Committee. Every effort will be made to honor poster only presentation requests.

  • All submissions must be completed electronically via the online abstract submission portal. 
  • Authors are required to acknowledge that by submitting an abstract, permission is automatically given for the abstract (if approved) to be made available on the website and via the virtual platform, and possibly published more broadly.